| 非平衡度和闭合状态对磁控溅射离子镀过程的影响 |
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| 引用本文： | 蒋百灵,文晓斌,栾亚,丁小柯,李显. 非平衡度和闭合状态对磁控溅射离子镀过程的影响[J]. 材料热处理学报, 2009, 30(2) |
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| 作者姓名： | 蒋百灵 文晓斌 栾亚 丁小柯 李显 |
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| 作者单位： | 西安理工大学材料学院,陕西,西安,710048 |
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| 基金项目： | 国家高技术研究发展计划(863计划);;闭合场非平衡磁控溅射离子镀镀膜装备研制和技术开发(2005AA33H010) |
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| 摘 要： | 利用非平衡磁控溅射离子镀技术于不同磁控管非平衡度和磁场闭合状态下在单晶硅基体上制备出Cr镀层,采用扫描电子显微镜、X射线衍射仪分析了不同生长阶段Cr镀层的微观形貌、表面粗糙度和晶体择优生长趋势的变化。结果表明:磁控管非平衡和磁场闭合状态的改变显著影响着Cr镀层生长过程中的结晶取向、表面粗糙度和致密度。不同非平衡度下,Cr镀层组织为疏松的柱状晶体组织,镀层表面粗糙度随磁控管非衡度的增大而增大。随着磁场闭合程度的增加,Cr镀层组织由疏松的柱状晶体组织,向较致密的柱状晶体再向致密的无明显柱状晶体的组织转化,镀层晶体有沿低能量(110)晶面生长向高能量(200)晶面过渡择优生长的趋势。
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| 关 键 词： | 磁控管非平衡度 闭合状态 磁控溅射离子镀 粗糙度 择优取向 |
Influence of unbalanced coefficient of magnetron and closed-state of magnertic field on plating Cr coating using a sputtering ion plating system |
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| JIANG Bai-ling,WEN Xiao-bin,LUAN Ya,DING Xiao-ke,LI Xian. Influence of unbalanced coefficient of magnetron and closed-state of magnertic field on plating Cr coating using a sputtering ion plating system[J]. Transactions of Materials and Heat Treatment, 2009, 30(2) |
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| Authors: | JIANG Bai-ling WEN Xiao-bin LUAN Ya DING Xiao-ke LI Xian |
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| Affiliation: | Faculty of Material Science and Engineering;Xi'an University of Technolog;Xi'an 710048;China |
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| Abstract: | Cr coatings were deposited on surface of Si substrate at different unbalanced cofficient of magnetron and closed-state of magnertic field using an unbalanced sputtering ion plating system.SEM,surface roughness tester and XRD were used to analyze the influence of unbalanced coefficient of magnetron and closed-state of magnertic field on microstructure,surface roughness and preferred orientation of the Cr coatings.The results show that the changes of unbalanced coefficient of magnetron and closed-state of mag... |
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| Keywords: | unbalanced coefficient of magnetron closed-state of magnertic field sputtering ion plating roughness preferred orientation |
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