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ZnS薄膜的溅射沉积及其XPS研究
引用本文:周咏东,方家熊,李言谨,龚海梅,汤定元. ZnS薄膜的溅射沉积及其XPS研究[J]. 无机材料学报, 2000, 15(6): 1127-1130
作者姓名:周咏东  方家熊  李言谨  龚海梅  汤定元
作者单位:1. 苏州大学物理系, 苏州 215006; 2. 中国科学院上海技术物理研究所, 上海 200083
基金项目:国家高技术航天领域青年基金资助!(863-2.00.4),江苏省教委自然科学基金资助!(98KJB430001)
摘    要:用Ar束溅射沉积技术在HgCdTe表面实现了ZnS的低温沉积.用X射线光电子能借(XPS)对上述ZnS薄膜以及热蒸发ZnS薄膜中的Zn、S元素的化学环境进行了对比实验研究.实验表明:离子束溅射沉积ZnS薄膜具有很好的组份均匀性,未探测到元素Zn、S的沉积.

关 键 词:ZnS  离子束溅射沉积  XPS  HgCdTe  表面抗反射膜  
文章编号:1000-324X(2000)06-1127-04
收稿时间:1999-12-16
修稿时间:1999-12-16

Sputtering Deposition and X-ray Photoelectron Spectroscopy Study for the ZnS Thin Film
ZHOU Yong-dong,FANG Jia-xiong,LI Yan-Jin,GONG Hai-mei,TANG Ding-Yuan. Sputtering Deposition and X-ray Photoelectron Spectroscopy Study for the ZnS Thin Film[J]. Journal of Inorganic Materials, 2000, 15(6): 1127-1130
Authors:ZHOU Yong-dong  FANG Jia-xiong  LI Yan-Jin  GONG Hai-mei  TANG Ding-Yuan
Affiliation:1.Physics Department of Soochow University; Suzhou 215006; China; 2. Shanghai Institute of Technical Physics; Chinese Academy of Science; Shanghai 200083; China
Abstract:The ZnS film was grown on HgCdTe surface by using the low-temperature ion beam sputtering technique. Zn and S elements in the sputtering ZnS film sample were studied and compared with those in the evaporating ZnS film by using X-ray photoelectron spectroscopy (XPS) technique. It is proved that the constituent elements are homogeneous, and the deposition of element Zn, S cannot be detected in the sputtering ZnS film.
Keywords:ZnS  ion beam sputtering deposition technique  XPS  HgCdTe  surface anti-reflection coat
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