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Successive deposition of layered titanium oxide/indium tin oxide films on unheated substrates by twin direct current magnetron sputtering
Authors:Kee-Rong Wu  Chieh-Hung Ting  Wu-Chien Liu  Chao-Hsien Lin  Jiing-Kae Wu
Affiliation:

aDepartment of Marine Engineering, National Kaohsiung Marine University, Kaohsiung 811, Taiwan

bMetal Industries Research and Development Centre, Treatment Processing and Equipment Section, Taiwan

Abstract:Layered titanium oxide/indium tin oxide (TiO2/ITO) films were successively deposited on unheated glass substrates in situ using a twin direct current magnetron sputtering system. The layered TiO2/ITO films exhibited a strongly polycrystalline structure that comprises anatase and rutile phases, as revealed by X-ray diffraction and Raman spectra. The X-ray photoelectron spectrum of Ti2p also verified the stoichiometric state of titanium oxide near the surface. The photo-induced hydrophilic properties of the films were determined from changes in the water contact angles under ultra-violet (UV) irradiation. The results revealed that the layered TiO2/ITO films possessed a dissipated rate of 30% when they were stored in the dark for 12 h. This result shows that the layered TiO2/ITO films acted as “electron pools” with an inherent energy storage capability. This unique property is attributable to the rougher surface and nearly porosity-free columnar structure, which is responsible for increased UV energy absorption and loss-free hole or electron transportation.
Keywords:Titanium oxide  Indium tin oxide  Sputtering  Surface roughness
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