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离子束刻蚀过程中台阶侧壁倾斜现象研究
引用本文:李红军,卢振武,廖江红,翁志成.离子束刻蚀过程中台阶侧壁倾斜现象研究[J].微细加工技术,2000(2):28-33.
作者姓名:李红军  卢振武  廖江红  翁志成
作者单位:中国科学院长春光机所应用光学国家重点实验室,长春,130022
摘    要:从标量衍射理论出发,在傅立叶光学的基础上,建立一个数学模型,分析台阶侧壁倾斜对多阶菲涅耳透镜衍射效率的影响。并通过实验,分析影响台阶侧壁倾斜、表面粗糙度和刻蚀速率的因素,确定离子束刻蚀菲涅耳透镜的最佳工艺参数。

关 键 词:离子束刻蚀  台阶侧壁倾斜  标量衍射
文章编号:1003-8213(2000)02-0006-06
修稿时间:1999-08-20

study on step sidewall tilt in ion beam etching of Fresnel lens
LI Hong-jun,LU Zhen-wu,LIAO Jiang-hong,WENG Zhi-cheng.study on step sidewall tilt in ion beam etching of Fresnel lens[J].Microfabrication Technology,2000(2):28-33.
Authors:LI Hong-jun  LU Zhen-wu  LIAO Jiang-hong  WENG Zhi-cheng
Affiliation:LI Hong-jun ,LU Zhen-wu ,LIAO Jiang-hong ,WENG Zhi-cheng ;(The State Key Laboratory of Applied Optic Changchun Institute of Optical and Fine Mechanics, Chinese Academy of Sciences, Changehun 130022, China)
Abstract:Based on the theory of scalar diffraction and on the Fourier optics. a mathematical model is established. The effect of step sidewall tilt on diffractive efficiency of Fresnel lens is analyzed. In our experiment, the factor affecting step sidewall tilt, surface roughness and etching speed are analyzed. The optimal technical parameters of ion beam etching of Fresnel lens are confirmed.
Keywords:Ion beam etching  Fresnel lens  step sidewall tilt  diffractive efficiency
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