| 氧在溅射和退火过程中对ZnO薄膜的影响研究 |
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| 引用本文： | 徐芸芸,张韬,陈晰,徐新,李争鸣. 氧在溅射和退火过程中对ZnO薄膜的影响研究[J]. 表面技术, 2009, 38(4): 23-25 |
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| 作者姓名： | 徐芸芸 张韬 陈晰 徐新 李争鸣 |
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| 作者单位： | 徐州空军学院,江苏,徐州,221008;徐州空军学院,江苏,徐州,221008;徐州空军学院,江苏,徐州,221008;徐州空军学院,江苏,徐州,221008;徐州空军学院,江苏,徐州,221008 |
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| 摘 要： | 利用射频磁控溅射技术在玻璃基片上制备了高度C轴择优取向的纳米ZnO薄膜,采用扫描电子显微镜、电子能谱仪和X射线衍射分析仪研究了溅射过程中和热处理过程中氧气对ZnO薄膜形貌、成分以及结构的影响规律.结果表明:在溅射过程中和退火过程中通入适量的氧气,ZnO薄膜(002)衍射面的晶面间距变小,薄膜中的氧含量提高,薄膜中的缺陷减少.在空气气氛中退火2h的薄膜,质量几乎接近了在溅射过程中通入氧气所制得的样品.因此在溅射制备ZnO薄膜时,可以减少氧气用量甚至无需通入氧气,而在热处理过程中实现增氧,从而降低了制备成本,简化了薄膜的制备工艺.
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| 关 键 词： | ZnO薄膜 XRD 氧气 退火 |
Effect of Oxygen on ZnO Thin Film in Sputtered and Annealed State |
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| XU Yun-yun,ZHANG Tao,CHEN Xi,XU Xin,LI Zheng-ming. Effect of Oxygen on ZnO Thin Film in Sputtered and Annealed State[J]. Surface Technology, 2009, 38(4): 23-25 |
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| Authors: | XU Yun-yun ZHANG Tao CHEN Xi XU Xin LI Zheng-ming |
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| Affiliation: | XU Yun-yun,ZHANG Tao,CHEN Xi,XU Xin,LI Zheng-ming(Xuzou Air Force College,Xuzhou 221008,China) |
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| Abstract: | Highly C-axis oriented nano-ZnO thin films were prepared by RF-magnetron sputtering technique on normal glass wafers.The influence rules of oxygen used in sputtering and post-deposition heat treatment process on the surface morphology composition,and structure of ZnO thin film were studied by SEM,EDX and XRD technique.The results show that introduction of measurable oxygen during the sputtering and post-deposition heat treatment process results in reduction of the spacings of(002) crystal plane,increase of ... |
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| Keywords: | XRD |
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