Study of Electron Transport in SOI MOSFETs Using Monte Carlo Technique with Full-Band Modeling

Effects of conduction-band non-parabolicity on electron transport properties in silicon-on-insulator (SOI) metal-oxide-semiconductor field effect transistors (MOSFETs) are studied by performing Monte Carlo simulation with a full-band modeling. An empirical pseudo-potential method is adopted for evaluating the two-dimensional electronic states in SOI MOSFETs. SOI-film thickness dependence of phonon-limited mobility, drift-velocity and subband occupancy is calculated and the results are compared with those of a simple effective mass approximation. The non-parabolicity effects are found to play an important role in 4-fold valleys under higher applied electric fields or at higher temperatures.