化学气相沉积镀膜机控制研究 |
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引用本文: | 徐香坤,王庆,徐化冰,宋允书.化学气相沉积镀膜机控制研究[J].真空与低温,2008,14(2):109-114. |
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作者姓名: | 徐香坤 王庆 徐化冰 宋允书 |
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作者单位: | 1. 沈阳理工大学应用技术学院,辽宁,抚顺,113122 2. 东北大学机械工程与自动化学院,辽宁沈阳,110004 3. 渤海船舶职业学院动力工程系,辽宁,葫芦岛,125000 4. 鞍钢房产建设有限公司,第二建筑工程分公司,辽宁,鞍山,114003 |
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摘 要: | 以RF-500型镀膜机为例介绍了化学气相沉积(CVD)镀膜机的结构以及工作原理;为克服RF-500型CVD镀膜机传统的电气控制缺点,开发了一套基于工业控制计算机的控制系统。描述了该镀膜机控制系统的硬件结构和软件功能。对基片温度、气体流量及开关量的控制效果进行了大量的实验研究。结果表明:基片温度控制精度达到±1℃、工作(反应)气体的流量控制精度达到10mL/min,可以进行精确的开关量控制。应用表明:该控制系统可以实时监控RF-500型CVD镀膜机的运行。
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关 键 词: | 化学气相沉积 镀膜机 温度 气体流量 控制 精度 |
RESEARCH ON CONTROL OF CHEMICAL VAPOUR DEPOSIT COATING MACHINE |
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Affiliation: | XU Xiang-kun,WANG Qing,XU Hua-bing, SONG Yun-shu ( 1.School of Application Technology, Shenyang Ligong University, Fushun 113122, China; 2. School of Mechanical Engineering & Automation, Northeastern University, Shenyang 110004, China; 3. Department of Dynamic Engineering, Bohai Shipbuilding Vocational College, Huludao 125000, China; 4.The 2nd Subsidiary company, Angang Building Co., Ltd., Anshan 114003, China) |
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Abstract: | The paper introduces not only the hardware construction and software function of the RF-500 coating machine but also hardware composition and software architecture the new computer control system. A PC-based control system is developed for RF-500 chemical vapour deposit (CVD)coating machine in order to overcome shortcoming of traditional control manner. Lots of experiments are perform about substrate temperature , gas flow and swiching value aiming to obtain satisfactory control effect.The research resouhs indicate that temperature control error +1 ℃ is obtained and flow control error is 10 mL/min. The application indicates that the control system can real-time monitor performance of RF- 500 CVD coating machine |
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Keywords: | chemical vapour deposit coating machine temperature gas flow control accuracy |
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