A thin-film waveguide photodetector using hydrogenated amorphoussilicon |
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| Authors: | Howerton M.M. Batchman T.E. |
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| Affiliation: | Dept. of Electr. Eng., Virginia Univ., Charlottesville, VA; |
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| Abstract: | Metal-silicon-metal cladding layers on dielectric waveguides exhibit coupling and absorption characteristics that make them useful as photodetectors for integrated optical applications. Multilayer computer-modeling techniques were applied to waveguide photodetectors in order to investigate field and power distributions, as well as the attenuation and phase response in the guiding region. A waveguide photodetector based on amorphous silicon was fabricated and demonstrated |
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