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铝基Al2O3纳米多孔表面大容积池沸腾实验
引用本文:左少华,赵晓玥,王杰阳,魏峰,史晓平,陶金亮.铝基Al2O3纳米多孔表面大容积池沸腾实验[J].化工进展,2015,34(5):1254-1258.
作者姓名:左少华  赵晓玥  王杰阳  魏峰  史晓平  陶金亮
作者单位:1. 河北工业大学化工学院, 天津 300130; 2. 西安交通大学化学工程与技术学院, 陕西 西安 710049; 3. 天津科技大学机械工程学院, 天津 300222
基金项目:河北省自然科学基金项目(B2012202082)。
摘    要:目前微电子器件不断地向高密度、微型化、功能化方向发展,散热问题是制约技术进一步发展的瓶颈.本文拟利用纳米多孔表面优良的相变传热特性,解决电子器件微型化散热难的问题.文中以铝基Al2O3纳米多孔薄膜为传热表面,以去离子水为工质,常压下对其大容积池沸腾下的传热性能进行了实验研究.实验结果表明:与光滑表面相比,Al2O3纳米多孔表面在核态沸腾时汽化核心密集,产生汽泡体积小、数量多并能提高铝基传热表面的传热系数2~5倍,且能够在长时间内维持其较高的传热系数;以纳米多孔表面作为传热表面,可以有效降低微电子原件表面温度3~5℃,在核态沸腾阶段能够降低30℃以上,很好地起到了降低电子元件表面温度的作用.实验结果对微电子冷却有重要的参考作用.

关 键 词:多孔介质  传热  氧化铝  池沸腾  芯片散热  
收稿时间:2014-10-16

Experimental study on pool boiling of aluminum base Al2O3 nano-porous surface
ZUO Shaohua,ZHAO Xiaoyue,WANG Jieyang,WEI Feng,SHI Xiaoping,TAO Jinliang.Experimental study on pool boiling of aluminum base Al2O3 nano-porous surface[J].Chemical Industry and Engineering Progress,2015,34(5):1254-1258.
Authors:ZUO Shaohua  ZHAO Xiaoyue  WANG Jieyang  WEI Feng  SHI Xiaoping  TAO Jinliang
Affiliation:1. School of Chemical Engineering, Hebei University of Technology, Tianjin 300130, China;
2. School of Chemical Engineering and Technology, Xi'an Jiaotong University, Xi'an 710049, Shaanxi, China;
3. School of Mechanical Engineering, Tianjin University of Science & Technology, Tianjin 300222, China
Abstract:The problem of heat dissipation is the bottleneck for the further development of micro-devices because the high density,microminiaturization and functional systemic. In this paper,Nano-porous surfaces' excellent phase change heat transfer characteristics were analyzed to solve this problem. An experimental study on the pool boiling heat transfer performance of the aluminum base Al2O3 nano-porous film was conducted with water under normal pressure. Experimental results showed that Al2O3 nano-porous surface improved the heat transfer coefficient of the aluminum heat transfer surfaces 2-5 times compared with the smooth-surfaced devices,and could maintain high heat transfer coefficient in a long time,because the intensive vaporized core could produce large amount of small bubbles. The surface temperature of microelectronic could be effectively decreased by 3-5℃,even by more than 30℃ in nucleate boiling stage with nano-porous surface as heat transfer surface.
Keywords:porous media  heat transfer  alumina  polling boiling  electronic chip cooling
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