Optical wavefront measurement and/or modification using integratedoptics |
| |
Authors: | Rediker R.H. Lind T.A. Burke B.E. |
| |
Affiliation: | Lincoln Lab., MIT, Lexington, MA; |
| |
Abstract: | Sensors consisting of an array of interferometers to measure phase differences and straight waveguides to measure intensity along an optical wavefront have been fabricated in LiNbO3 at four wavelengths, λ=0.458, 0.514, 0.82, and 3.39 μm, and the performance of the sensors has been evaluated. The outputs of the arrays are coupled to an imaging CCD and fed into a computer. Calculations are presented for a conceptual design of a scanning one-dimensional array producing a 50×50 pixel snapshot. Experimental results are presented for 20-resolution-element one-dimensional interferometer arrays at 0.514, 0.82, and 3.39 μm. The results indicate that accurate modification of wavefronts as well as measurements of wavefronts are possible. Two structures for modification of optical wavefronts are proposed |
| |
Keywords: | |
|
|