| 一种增磁装置在磁控射频溅射制备薄膜中的应用 |
| |
| 引用本文： | 王怀义,刁训刚,王聪,郝维昌,王天民.一种增磁装置在磁控射频溅射制备薄膜中的应用[J].功能材料与器件学报,2011,17(3):237-241. |
| |
| 作者姓名： | 王怀义 刁训刚 王聪 郝维昌 王天民 |
| |
| 作者单位： | 北京印刷学院基础部;北京航空航天大学物理学院; |
| |
| 基金项目： | 国家重点基础研究发展计划(973)项目(2007CB936300) |
| |
| 摘 要： | 为提高射频溅射成膜率,本文报道了一种配置于磁控溅射装置的射频(RF)增磁装置.基于此装置的实验结果表明,在不对原有装置作任何改动的情况下,在完全相同的溅射参数下,采用此装置可使射频溅射成膜率增大为原来的4倍左右.进而,该装置提供了一种能有效地节省溅射制备时间,改善薄膜结构的简便易行的新型手段.
|
| 关 键 词： | 射频磁控溅射 增磁装置 沉积速率 薄膜结钩 |
Application of a apparatus increasing magnetic field in magnetron R.F.depositing films |
| |
| WANG Huai-yi,DIAO Xun-gang,WANG Cong,HAO Wei-chang,WANG Tian-min.Application of a apparatus increasing magnetic field in magnetron R.F.depositing films[J].Journal of Functional Materials and Devices,2011,17(3):237-241. |
| |
| Authors: | WANG Huai-yi DIAO Xun-gang WANG Cong HAO Wei-chang WANG Tian-min |
| |
| Affiliation: | WANG Huai-yi1,2,DIAO Xun-gang2,WANG Cong2,HAO Wei-chang2,WANG Tian-min2(1.Science Education Department,Beijing Institute of Graphic Communication,Beijing 102500,China,2.School of Physics,Beihang University,Beijing 100083,China) |
| |
| Abstract: | To increase deposition rate of R.F.sputtering,this paper has reported an apparatus,with which magnetron sputtering installation has been equipped.Experimental results have shown that without changing original installation and with using identical sputtering parameters,relying on the apparatus can make deposition rate effectively increase.Ratio of deposition rates of films prepared with the apparatus to deposition rates of films deposited without it is about 4:1.Therefore,the apparatus provides a simple,conv... |
| |
| Keywords: | R F magnetron sputtering apparatus increasing magnetic field deposition rate |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
|
