| Al_2O_3陶瓷基片上Ba_(0.7)Sr_(0.3)TiO_3薄膜可调介电性能的研究 |
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| 引用本文： | 王元,蒋书文,陈湘亮. Al_2O_3陶瓷基片上Ba_(0.7)Sr_(0.3)TiO_3薄膜可调介电性能的研究[J]. 功能材料, 2011, 0(Z2) |
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| 作者姓名： | 王元 蒋书文 陈湘亮 |
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| 作者单位： | 电子科技大学电子薄膜与集成器件国家重点实验室; |
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| 基金项目： | 国家自然科学基金资助项目(60871049) |
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| 摘 要： | 采用磁控溅射方法在Al2O3陶瓷基片上溅射生长Ba0.7Sr0.3TiO3(BST)薄膜,使用光刻工艺制作平板结构的BST薄膜可变电容。研究了溅射条件对BST薄膜可调介电性能和介电损耗的影响。结果表明,在溅射气压为4Pa、O2∶Ar比为30∶70、基片温度800℃下制备的BST薄膜具有较高的介电调谐率(约52%)和较低的损耗(约0.8%),BST薄膜可变电容的品质因素随频率升高而降低,在1~100MHz频率范围内品质因素从125下降为42。
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| 关 键 词： | BST薄膜 Al2O3陶瓷基片 磁控溅射 可变电容 |
Investigation on tunable dielectric performance of Ba_(0.7)Sr_(0.3)TiO_3 thin films deposited on Al_2O_3 alumina ceramic substrates |
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| WANG Yuan,JIANG Shu-wen,CHEN Xiang-liang. Investigation on tunable dielectric performance of Ba_(0.7)Sr_(0.3)TiO_3 thin films deposited on Al_2O_3 alumina ceramic substrates[J]. Journal of Functional Materials, 2011, 0(Z2) |
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| Authors: | WANG Yuan JIANG Shu-wen CHEN Xiang-liang |
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| Affiliation: | WANG Yuan,JIANG Shu-wen,CHEN Xiang-liang (State Key Laboratory of Electronic Thin Film and Integrated Devices,University of Electronic Science and Technology of China,Chengdu 610054,China) |
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| Abstract: | |
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| Keywords: | BST thin film Al2O3 alumina ceramic substrate RF magnetron sputtering tunable capacitor |
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