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A computer calculation of step coverage in SiO thin films |
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| Authors: | G.R. Proto I.A. Blech P.D. Hoh |
| Affiliation: | IBM T.J. Watson Research Center, Yorktown Heights, NY U.S.A.;Technion, Haifa, Israel;IBM T.J. Watson Research Center, Yorktown Heights, NY, U.S.A. |
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