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At the limit of polychromatic microdiffraction
Authors:Gene E. Ice   Judy W.L. Pang   Bennett C. Larson   John D. Budai   Jonathan Z. Tischler   Jae-Young Choi   Wenjun Liu   Chian Liu   Lahsen Assoufid   Deming Shu  Ali Khounsary
Affiliation:aMST Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831-6118, United States;bPohang Accelerator Laboratory, Pohang, Republic of Korea;cAdvanced Photon Source, Argonne National Laboratory, Argonne, IL 60439, United States
Abstract:With a high-energy 3rd generation source like the Advanced Photon Source (APS), it is possible to push the performance of polychromatic microdiffraction far beyond current levels and to approach the intrinsic limit of the technique based on sample damage and the diffraction limit of X-rays. We describe ongoing efforts to improve the spatial, temporal and momentum transfer resolution of polychromatic microdiffraction on beamline 34-ID-E at the APS. The goal of this effort is to provide high-resolution images of 3D crystal structures over sufficient volumes and with sufficient detail to clarify the underlying physics of inhomogeneous structure and evolution on mesoscopic length scales. The performance of a high-speed amorphous Si area detector system and the ongoing development of advanced focusing optics will be described and discussed in light of the ultimate limits set by the physics of X-rays and materials, and in light of opportunities to field specialized insertion devices and optics for polychromatic microdiffraction.
Keywords:Microbeam   Laue diffraction   Mesoscale   Structure   X-ray
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