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化学抛光对铝阳极氧化膜影响研究
引用本文:吴少华,彭乔,袁新国. 化学抛光对铝阳极氧化膜影响研究[J]. 辽宁化工, 2010, 39(6): 571-573,592
作者姓名:吴少华  彭乔  袁新国
作者单位:大连理工大学化工学院,辽宁,大连116024
摘    要:利用表面粗糙度测量、金相显微镜和SEM对铝基体表面和膜的微观形貌观测,分别讨论了化学抛光时间、抛光液体积、使用次数和抛光温度对表面粗糙度和造孔表面形貌影响;结果表明,抛光时间、抛光液体积、使用次数和抛光温度对表面粗糙度和造孔表面形貌有不同程度的影响;最佳抛光时间2 min,最佳的制件面积:抛光液体积=2 cm2∶80 mL,使用前5次效果不变,最佳操作温度为100~105℃。

关 键 词:化学抛光  表面粗糙度  多孔阳极氧化膜  

Study on Effect of the Chemical Polishing on Porous Anodic Oxide Films of Aluminum
WU Shao-hua,PENG Qiao,YUAN Xin-guo. Study on Effect of the Chemical Polishing on Porous Anodic Oxide Films of Aluminum[J]. Liaoning Chemical Industry, 2010, 39(6): 571-573,592
Authors:WU Shao-hua  PENG Qiao  YUAN Xin-guo
Affiliation:WU Shao-hua,PENG Qiao,YUAN Xin-guo(School of Chemical Engineering,Dalian University of Technology,Dalian 116024,China)
Abstract:The surface of aluminium matrix and film micro-morphology were observed by roughness measurement,metallographic microscope and scanning electron microscope(SEM).Effects of chemical polishing time,polishing fluid volume,use frequency and polishing temperature on surface roughness and pore surface morphology were discussed.The results show that the chemical polishing time,polishing fluid volume,use frequency and polishing temperature have different degrees of impact on the surface roughness and pore surface.T...
Keywords:Chemical polishing  Surface roughness  Porous anodic oxide film  Aluminum  
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