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化学气相沉积技术及在难熔金属材料中的应用
引用本文:黎宪宽,陈力,蔡宏中,魏巧灵,胡昌义.化学气相沉积技术及在难熔金属材料中的应用[J].稀有金属材料与工程,2010,39(Z1).
作者姓名:黎宪宽  陈力  蔡宏中  魏巧灵  胡昌义
作者单位:1. 昆明贵金属研究所,云南,昆明,650106;云南省贵金属材料重点实验室,云南,昆明,650106
2. 昆明贵金属研究所,云南,昆明,650106;云南省贵金属材料重点实验室,云南,昆明,650106;昆明理工大学,云南,昆明,650093
基金项目:国家自然科学基金,云南省自然科学基金 
摘    要:简述了化学气相沉积技术(Chemical Vapor Deposition,简称CVD)的发展历程及其应用领域;重点阐述CVD技术在难熔金属(W、Re、Ta、Mo、Nb)相关领域的应用概况并展望了其研究前景,特别指出CVD技术在制备难熔金属合金研究上存在的挑战和机遇。

关 键 词:化学气相沉积  难熔金属  应用发展  挑战和机遇

Development of Chemical Vapor Deposition and Refractory Metal Materials
Li Xiankuan,Chen Li,Cai Hongzhong,Wei Qiaoling,Hu Changyi.Development of Chemical Vapor Deposition and Refractory Metal Materials[J].Rare Metal Materials and Engineering,2010,39(Z1).
Authors:Li Xiankuan  Chen Li  Cai Hongzhong  Wei Qiaoling  Hu Changyi
Affiliation:Li Xiankuan1,2,Chen Li1,3,Cai Hongzhong1,Wei Qiaoling1,Hu Changyi1,3 (1.Kunming Institute of Precious Metals,Kunming 650106,China) (2.Yunnan Key Lab of Precious Metallic Materials,China) (3.Kunming University of Science , Technology,Kunming 650093,China)
Abstract:A brief overview of the development process and application areas of the Chemical Vapor Deposition (CVD) was presented.The emphasis was on the applications of the CVD technology in the refractory metal-related fields as well as the research prospect,and it was noted that the opportunity goes with the challenge in studying refractory metal alloys prepareted by CVD technology.
Keywords:CVD  refractory metals  application development  challenge and opportunity  
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