| 硅台面结构凸角腐蚀原因探析 |
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| 引用本文： | 黄庆安 秦明. 硅台面结构凸角腐蚀原因探析[J]. 仪表技术与传感器, 1996, 0(1): 15-16,21 |
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| 作者姓名： | 黄庆安 秦明 |
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| 作者单位： | 东南大学微电子中心，东南大学微电子中心，东南大学微电子中心 南京市 210096，南京市 210096，南京市 210096 |
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| 摘 要： | 本文探讨了硅台面结构凸角腐蚀的原因。指出非理想的直角掩膜结构导致了凸角腐蚀，凸角处侧壁由横向腐蚀速率最快的晶面所构成。
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| 关 键 词： | 腐蚀 凸角 硅台面结构 金属切削 |
On the Convex Corner Etching of Silicon Mesa Structure |
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| Huang Qingan,Qin Ming and Xiang TaoSoutheast University,Nanjing .. On the Convex Corner Etching of Silicon Mesa Structure[J]. Instrument Technique and Sensor, 1996, 0(1): 15-16,21 |
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| Authors: | Huang Qingan Qin Ming Xiang TaoSoutheast University Nanjing . |
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| Affiliation: | Huang Qingan,Qin Ming and Xiang TaoSoutheast University,Nanjing 210096. |
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| Abstract: | The etching cause of silicon convex corner is discussed in this paper. According to this paper, it is the imperfect right angle of the mask that results in the etching of convex silicon corner. The side walls of the convex corner are crystalline planes that have the highest traversal etching rate. |
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| Keywords: | Etching Mask Convex Corner. |
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