| 对磁流变抛光技术中磁场的分析 |
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| 引用本文： | 张峰,余景池,张学军,谭庆昌. 对磁流变抛光技术中磁场的分析[J]. 仪器仪表学报, 2001, 22(1): 42-44,48 |
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| 作者姓名： | 张峰 余景池 张学军 谭庆昌 |
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| 作者单位： | 1. 中国科学院
2. 吉林工业大学机械零件教研室 |
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| 基金项目： | 国家自然科学基金资助项目，No69608006。 |
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| 摘 要： | 本文对磁流变抛光(magnetorheological finishing)过程中所采用的梯度磁场，以及磁流变抛光液（MRP fluid）中的磁性颗粒在磁场中的受力情况进行了分析，进而证明了该磁场满足磁流变抛光的要求。最后以实验对其进行了验证。
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| 关 键 词： | 磁流变抛光 磁流变抛光液 标量磁位 磁偶极子 磁场分析 |
Analysis of magnetic fieldused in magnetorheological finishing |
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| Zhang Feng,Yu Jingchi,Zhang Xuejun,Tan Qingchang. Analysis of magnetic fieldused in magnetorheological finishing[J]. Chinese Journal of Scientific Instrument, 2001, 22(1): 42-44,48 |
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| Authors: | Zhang Feng Yu Jingchi Zhang Xuejun Tan Qingchang |
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| Affiliation: | Zhang Feng 1Yu Jingchi 1Zhang Xuejun 2Tan Qingchang 1 |
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| Abstract: | The gradient magnetic field used in magnetorheological finishing(MRF) and the force of magnetic particle of magnetorheological polishing fluid(MRP fluid) in magnetic field are analyzed, and it is proved that the magnetic field can meet the requirement of MRF. Finally, the magnetic device was verified by means of experiments. |
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| Keywords: | Magnetorheological finishing Magnetorheological polishing fluid Scalar magnetic potential Magnetic dipole |
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