| 表面处理对氮化硅陶瓷力学性能的影响 |
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| 引用本文： | 张东方.表面处理对氮化硅陶瓷力学性能的影响[J].佛山陶瓷,2003,13(5):11-12. |
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| 作者姓名： | 张东方 |
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| 作者单位： | 武汉理工大学材料复合新技术国家重点实验室,武汉,430070 |
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| 摘 要： | 采用X射线衍射应力分析的sin2ψ法计算了Si3N4陶瓷试样的残余应力，并分别测量了表面处理前后Si3N4试样的力学性能。结果表明，经平面磨削后的Si3N4试样表面残余应力为拉应力，而抛光处理可适当降低残余应力。两种方法都使试样抗弯强度降低。
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| 关 键 词： | 表面处理 氮化硅陶瓷 力学性能 X射线衍射应力 sin2ψ法 残余应力 磨削 抛光 抗弯强度 |
Effect of Grinding and Polishing on Residual Stress and Bending Strength of Silicon Nitride Ceramic |
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| Zhang,Dongfang.Effect of Grinding and Polishing on Residual Stress and Bending Strength of Silicon Nitride Ceramic[J].Foshan Ceramics,2003,13(5):11-12. |
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| Authors: | Zhang Dongfang |
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| Abstract: | The residual stresses on the surface of the grinded and polished silicon nitride ceramics are measured using x-ray diffraction method.The effect of the residual stress on the bending strength is investigated.It is found that the residual stress introduced by grinding process is tensile and has a significant effect on reducing the bending strength. |
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| Keywords: | residual stress grinding polishing bending strength Si3N4 ceramicsering |
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