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Structural and optical properties of pulsed laser deposited V2O5 thin films |
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| Authors: | S Beke S Giorgio L K&#x;rsi L Nnai W Marine |
| Affiliation: | aCRMC-N, UPR 7251 CNRS, Université de la Méditerranée, Case 901, 13288 Marseille Cedex 9, France bDepartment of Otolaryngology, Faculty of Medicine, University of Szeged, Tisza Lajos krt.111, Szeged, H-6725 Hungary cSupramolecular and Nanostructured Materials Research Group of the Hungarian Academy of Sciences, University of Szeged, H-6720 Szeged, Aradi V. t. 1, Hungary dUniversity of Szeged, Department of Physics, JGYTFK, Boldogasszony sgt. 6., Szeged, H-6725 Hungary |
| Abstract: | Pulsed laser deposited nanocrystalline V2O5 thin films were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), high-resolution transmission electron microscopy (HRTEM) and optical spectroscopy. The films were deposited on amorphous glass substrates, keeping the O2 partial pressure at 13.33 Pa and the substrate temperature at 220 °C. The characteristics of the films were changed by varying the laser fluence and repetition rate. XRD revealed that films are nanocrystalline with an orthorhombic structure. XPS shows the sub-stoichiometry of the films, that generally relies on the fact that during the formation process of V2O5 films, lower valence oxides are also created. From the HRTEM images, we observed the size evolution and distribution characteristics of the clusters in the function of the laser fluence. From the spectral transmittance we determined the absorption edge using the Tauc plot. Calculation of the Bohr radius for V2O5 is also reported. |
| Keywords: | Vanadium oxide thin films Ablation Pulsed laser deposition X-ray diffraction Transmission Electron Microscopy X-ray photoelectron spectroscopy Absorption edge Optical transmission Bohr radius |
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