| Optimization of Plasma Etching Parameters and Mask for Silica Optical Waveguides |
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| 引用本文： | Zhou Libing,Liu Wen,and Wu Guoyang. Optimization of Plasma Etching Parameters and Mask for Silica Optical Waveguides[J]. 半导体学报, 2005, 26(6): 1104-1110 |
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| 作者姓名： | Zhou Libing Liu Wen and Wu Guoyang |
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| 作者单位： | 武汉邮电科学研究院 武汉430074(周立兵，刘文)，武汉邮电科学研究院 武汉430074(吴国阳) |
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| 基金项目： | 国家高技术研究发展计划(863计划) |
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| 摘 要： | Optical waveguides in silica-on-silicon are one of the key elements in optical communications.The processes of deep etching silica waveguides using resist and metal masks in RIE plasma are investigated.The etching responses,including etching rate and selectivity as functions of variation of parameters,are modeled with a 3D neural network.A novel resist/metal combined mask that can overcome the single-layer masks’ limitations is developed for enhancing the waveguides deep etching and low-loss optical waveguides are fabricated at last.
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| 关 键 词： | reactive ion etching；silica-on-silicon optical waveguides；3D neural network |
Optimization of Plasma Etching Parameters and Mask for Silica Optical Waveguides |
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| Zhou Libing,Liu Wen,Wu Guoyang. Optimization of Plasma Etching Parameters and Mask for Silica Optical Waveguides[J]. Chinese Journal of Semiconductors, 2005, 26(6): 1104-1110 |
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| Authors: | Zhou Libing Liu Wen Wu Guoyang |
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| Abstract: | |
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| Keywords: | reactive ion etching silica-on-silicon optical waveguides 3D neural network |
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