| 离子束溅射沉积光学薄膜速率分布 |
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| 引用本文： | 汤雪飞,范正修,王之江. 离子束溅射沉积光学薄膜速率分布[J]. 中国激光, 1993, 20(5): 345-348 |
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| 作者姓名： | 汤雪飞 范正修 王之江 |
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| 作者单位： | 中国科学院上海光机所，中国科学院上海光机所，中国科学院上海光机所 上海 201800，上海 201800，上海 201800 |
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| 摘 要： | 本文应用高斯型离子束流强度分布计算了离子束溅射沉积光学薄膜的沉积速率分布,结果表明,沉积速率空间分布偏离余弦分布,峰值位置随溅射离子束入射角改变并受离子束高斯半径的影响。实验结果与之相符。
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| 关 键 词： | 薄膜 离子束溅射沉积 沉积速率分布 |
| 收稿时间： | 1992-01-31 |
Optical coating deposition rate distribution by ion beam sputtering |
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| Tang Xuefei,Fan Zhengxiu,Wang Zhijiang. Optical coating deposition rate distribution by ion beam sputtering[J]. Chinese Journal of Lasers, 1993, 20(5): 345-348 |
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| Authors: | Tang Xuefei Fan Zhengxiu Wang Zhijiang |
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| Abstract: | Deposition rate distribution of optical coating deposited by ion beam sputtering were calculated using Ganssian distribution of ion beam intersity. The results show that the deposition rate distribution deviates from that of the cosine distribution, the position of peak value depends on the incident angle and Gaussian radius of ion beam. The experimental results agree with the theoretical results perfectly. |
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| Keywords: | thin film ion beam sputter deposition deposition rate distribution |
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