| a-Si:H和a-SiN:H薄膜的质子核磁共振研究 |
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| 引用本文： | 王济身,许春芳,金克彪,赵成斌.a-Si:H和a-SiN:H薄膜的质子核磁共振研究[J].固体电子学研究与进展,1989(4). |
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| 作者姓名： | 王济身 许春芳 金克彪 赵成斌 |
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| 作者单位： | 华东师范大学电子科学技术系
(王济身，许春芳，金克彪)，华东师范大学电子科学技术系(赵成斌) |
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| 摘 要： | <正> 由辉光放电分解硅烷淀积的氢化非晶态薄膜中都包含相当数量的氢,含氢量的多少直接对薄膜的结构、性质及稳定性有很大的影响。利用核磁共振(1H NMR)可以给出有关氢的局部环境和分布的信息。它与通常所用的红外、ESR、核共振等方法所获得的信息是不同的,因此1H NMR在材料结构分析方面是有其特色的。
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Proton Nuclear Magnetic Resonance Studies of a-Si:H and a-SiN:H Films |
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| Abstract: | 1H NMR spectra are presented for GD deposited a-Si:H and a-SiN:H films. The spectra consist of two components with different linewidths. The broad component (Gaussian) originates from clustered hydrogen, while the narrow one (Lorentzian) from random distributed hydrogen. The change of percent content of hydrogen and FWHM of each component with the deposite temperature are discussed. 1H NMR spectrum of 100℃ deposited a-SiN:H film shows a motional narrowing effect, and the linewidth of its narrow component is much lower, which means a very mobile species of hydrogen contained. |
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