铀表面磁控溅射镍镀层的电化学腐蚀行为研究

采用磁控溅射离子镀膜技术在贫铀表面制备金属镍镀层，利用电化学测试技术研究了镍镀层在Cl^-溶液中的电化学腐蚀行为。结果表明：在含50 μg/g Cl^-的KCl溶液中，镍镀层的腐蚀电位-100.8 mV高于贫铀的腐蚀电位-641.2 mV，相对于贫铀是阴极性镀层，对贫铀的保护基于对腐蚀介质的物理屏障；镀镍贫铀样品的极化电阻和电化学阻抗幅值远大于贫铀，其腐蚀电流远小于贫铀；约70 h的连续腐蚀实验中镍镀层未出现镀层破裂、剥落现象，且腐蚀电位、电流保持稳定。说明镍镀层对贫铀基体具有良好的防腐蚀性能。

Electrochemical Corrosion Behavior of MSIP Ni Coating on Depleted Uranium Surface

The Ni film was prepared by magnetron sputtering ion plating to improve the corrosion resistance of depleted uranium. The corrosion resistance of the Ni film was examined by electrochemical corrosion station. The results show that the Ni film corrosion potential is -100.8 mV, whereas it is -641.2 mV for depleted uranium in 50 μg/g KCl solution. The Ni film is a barrier to protect the depleted uranium substrate avoiding the corrosive media attack. The Ni film polarization resistance and impedance are much higher, while the corrosion current density is much lower contrast with depleted uranium. None crack or flake is found through 70 h corrosion. The corrosion resistance and corrosion current keep stable. It is indicated that the corrosion resistance of depleted uranium is effectively improved after deposited Ni film by magnetron sputtering ion plating.