| 电沉积法制备高孔率泡沫金属的电流密度控制 |
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| 引用本文： | 王殿龙,戴长松,姜兆华,胡信国,吴宁. 电沉积法制备高孔率泡沫金属的电流密度控制[J]. 哈尔滨工业大学学报, 2003, 35(2): 230-233 |
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| 作者姓名： | 王殿龙 戴长松 姜兆华 胡信国 吴宁 |
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| 作者单位： | 哈尔滨工业大学,应用化学系,黑龙江,哈尔滨,150001 |
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| 摘 要： | 针对高孔率泡沫金属的电阻特性，通过电流密度随时间的变化转换为镀区内的位置分布，建立了稳恒状态下，带状高孔率泡沫金属与阳极平行电沉积的理论模型，进而推导出表观电流密度分布的表达式，并对电化学步骤控制的泡沫金属电沉积进行了设备优化设计，使得泡沫金属电沉积的电流密度控制在最佳范围，保证泡沫金属的质量。这一工作，为电沉积法制备高孔率泡沫金属的设备制造和在线控制提供了理论依据，具有实际应用价值。
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| 关 键 词： | 制备 控制 泡沫金属 高孔率 表观电阻 连续电沉积 表观电流密度 电镀 |
| 文章编号： | 0367-6234(2003)02-0230-04 |
| 修稿时间： | 2002-05-16 |
Current density control for preparation of metal foam by electrodeposition |
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| WANG Dian long,DAI Chang song,JIANG Zhao hua,HU Xin guo,WU Ning. Current density control for preparation of metal foam by electrodeposition[J]. Journal of Harbin Institute of Technology, 2003, 35(2): 230-233 |
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| Authors: | WANG Dian long DAI Chang song JIANG Zhao hua HU Xin guo WU Ning |
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| Abstract: | For the resistance characteristic of high porosity metal foam and the conversion from the change of current density with time to that with position distribution in plating area, a theoretical model has been established for the parallel electrodeposition of metal foam and anode under a constant situation to show the apparent current density distribution. The metal foam electrodepostion equipment was also optimized to keep the current density in the optimum range and the quality of metal foam guarranteed. |
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| Keywords: | metal foam high porosity apparent resistance continuous electrodeposition apparent current density |
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