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射频溅射制备钛酸铅薄膜
引用本文:杨成韬,袁鑫,纪洪,李言荣.射频溅射制备钛酸铅薄膜[J].电子元件与材料,2001,20(2):16-18.
作者姓名:杨成韬  袁鑫  纪洪  李言荣
作者单位:电子科技大学信息材料工程学院,
摘    要:采用射频磁控溅射方法制备钙钛矿型钛酸铅铁电薄膜。通过各种不同溅射工艺条件研究,在适宜的溅射条件和基片温度下,溅射获得的PbTiO3薄膜表面晶粒大小均匀,膜层致密性好,经XRD分析证实,薄膜为钙钛矿型结构PbTiO3。外加Pt电极对薄膜进行测试表明,溅射得到的PbTiO3薄膜具有较好的电滞回线特性。

关 键 词:铁电薄膜  射频溅射  电滞回线  钛酸铅薄膜  晶化
文章编号:1001-2028(2001)02-0016-03

Preparation of PbTiO3 film by RF magnetron sputtering.
YANG Cheng-tao,YUAN Xin,JI Hong,LI Yan-rong.Preparation of PbTiO3 film by RF magnetron sputtering.[J].Electronic Components & Materials,2001,20(2):16-18.
Authors:YANG Cheng-tao  YUAN Xin  JI Hong  LI Yan-rong
Abstract:Ferro-electric PbTiO3 film is obtained by RF magnetron sputtering with PbTiO3 as target. The PbTiO3 acquired in appropriate conditions and at appropriate substrate temperature are homogeneous and compact. XRD results show that its phase structure is perovskite. The results of the test with additional Pt electrode show that the electric hysteresis loop is closer to rectangle. (5 refs)
Keywords:Ferro-electric film  magnetron sputtering  PbTiO3 film  electric hysteresis loop  PbTiO3 film  crystallization
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