| 等离子清洗技术(二) |
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| 引用本文： | 熊楚才.等离子清洗技术(二)[J].洗净技术,2003(8):38-41. |
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| 作者姓名： | 熊楚才 |
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| 作者单位： | 北京理工大学,北京,100081 |
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| 摘 要： | 文章对等离子清洗技术做了全面介绍,不仅介绍了有关等离子的基本概念、低温等离子体制备技术及其相关装置,而且着重介绍了它在精密清洗中的应用及其注意事项,指出等离子清洗技术在淘汰ODS清洗剂过程中能够发挥重要作用
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| 关 键 词： | 等离子体 清洗 |
Plasma Cleaning Technology(2) |
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| Authors: | Xiong Chucai |
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| Affiliation: | Xiong Chucai |
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| Abstract: | This article gives a full view about the plasma cleaning technique. It not only includes the general idea of plasma ,the technology of preparing low temperature plasma and its related equipment ,but also tells its application and points of attention in precision instrument cleaning .Plasma Cleaning will play an important role in elimination of ODS cleaning agent. |
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| Keywords: | plasma cleaning |
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