| 中频磁控溅射制备类金刚石薄膜的功率因素研究 |
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| 引用本文： | 邬苏东,彭志坚,陈新春,杨义勇,王成彪,付志强.中频磁控溅射制备类金刚石薄膜的功率因素研究[J].稀有金属材料与工程,2009,38(Z2). |
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| 作者姓名： | 邬苏东 彭志坚 陈新春 杨义勇 王成彪 付志强 |
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| 作者单位： | 中国地质大学,北京,100083 |
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| 基金项目： | 科技部重大国际合作项目资助 |
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| 摘 要： | 采用SP0806AS中频磁控溅射镀膜机,在硅(100)和高速钢基体上,采用双石墨靶在不同功率下沉积了类金刚石薄膜.研究表明,在功率为5～7 kW下薄膜具有较低的ID/IG比;所得薄膜表面平整,粗糙度Ra值在1.5～2.8 nm之间,薄膜厚度随功率增加而增大;在100～200 nm Ti膜作为过渡层条件下,薄膜纳米硬度和弹性模量随功率增加呈先增大后减小趋势,硬度/杨氏模量比值先增大后减小,当功率为7 kW时具有较高值;划痕实验临界载荷随功率增加先增大后减小,最大可大于50 N;薄膜的摩擦系数较小,平均摩擦系数可小于0.15;在50 g载荷下,薄膜磨穿的时间超过300 min.确定SP0806AS中频磁控溅射镀膜机沉积类金刚石薄膜的最佳功率范围是5～7 kW.
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| 关 键 词： | 中频磁控溅射 类金刚石薄膜 摩擦磨损性能 |
Study on Influence of Target Powers on Properties of Diamond-Like Carbon Films Deposited by Mid-Frequency Magnetron Sputtering System |
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| Wu Sudong,Peng Zhijian,Chen Xinchun,Yang Yiyong,Wang Chengbiao,Fu Zhiqiang.Study on Influence of Target Powers on Properties of Diamond-Like Carbon Films Deposited by Mid-Frequency Magnetron Sputtering System[J].Rare Metal Materials and Engineering,2009,38(Z2). |
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| Authors: | Wu Sudong Peng Zhijian Chen Xinchun Yang Yiyong Wang Chengbiao Fu Zhiqiang |
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| Affiliation: | Wu Sudong,Peng Zhijian,Chen Xinchun,Yang Yiyong,Wang Chengbiao,Fu Zhiqiang (China University of Geosciences,Beijing 10083,China) |
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| Abstract: | Diamond-like carbon (DLC) thin films were deposited onto Si (100) and high speed steel substrates by mid-frequency magnetron sputtering system (SP0806AS,Beijing Power tech Co.,Ltd.) with dual graphite targets of different target powers (3-8 kW). It is shown that,with the target power in the range of 5-7 kW,the as-prepared DLC thin films would have relatively low ID/IG in Raman spectra. The surfaces of DLC films are smooth with roughness Ra in the range of 1.5-2.8 nm. The thickness of the films increases wit... |
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| Keywords: | mid-frequency magnetron sputtering diamond-like carbon films friction properties |
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