| 钽等离子体渗氮的表面过程分析 |
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| 引用本文： | 张德元,李放,罗文,蔡莉,许兰萍,林勤. 钽等离子体渗氮的表面过程分析[J]. 中国有色金属学报, 2000, 10(2): 189-193 |
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| 作者姓名： | 张德元 李放 罗文 蔡莉 许兰萍 林勤 |
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| 作者单位： | 北京科技大学物理化学系!北京100083江西省科学院应用物理研究所，南昌330029，江西省科学院应用物理研究所!南昌330029，江西省科学院应用物理研究所!南昌330029，江西省科学院应用物理研究所!南昌330029，江西省科学院应用物理研究所!南昌330029，北京科技大学物理化学系!北京10008 |
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| 摘 要： | 对钽表面渗氮的固－气界面反应过程进行了热力学和动力学分析，从到理论预测了各种参数（压力、气体、组成、温度、电参数等）对表面过程的影响，并借助于等离子体，在较你廿获得由层与Ｎ在ＴＡ中的固溶体组成的表面硬化层，层为六方晶系的Ｔａ６Ｎ２，５７和／或非昌态。通过调整工艺参数有效地抑制了钽表面氧的渗入和Ｔａ２Ｏ５的形成，使得离子渗氮后，仍保持较低的表面粗糙度。
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| 关 键 词： | 钽 离子渗氮 表面过程 |
| 修稿时间： | 1999-08-20 |
Analysis of interface reactions during plasma nitriding of tantalum |
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| ZHANG De yuan ,,LI Fang ,LUO Wen ,CAI Li ,XU Lan ping ,LIN Qin. Analysis of interface reactions during plasma nitriding of tantalum[J]. The Chinese Journal of Nonferrous Metals, 2000, 10(2): 189-193 |
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| Authors: | ZHANG De yuan LI Fang LUO Wen CAI Li XU Lan ping LIN Qin |
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| Affiliation: | ZHANG De yuan 1,2,LI Fang 2,LUO Wen 2,CAI Li 2,XU Lan ping 2,LIN Qin 1 1. Department of Physical Chemistry,University of Science and Technology of Beijing,Beijing 100083,P.R.China, 2. Institute of Applied Physics,Jiangxi Academy |
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| Abstract: | The reaction process on the surface of solid gases during nitriding of tantalum was discussed thermodynamically and dynamically. The effects of technical parameters such as pressure, temperature, electrical current density and voltage on the surface process were analyzed theoretically. The nitriding layers on tantalum surfaces with high hardness and better roughness were obtained with the help of plasma at low temperature. The layers were composed of the solid solution of tantalum and surface layers, which are amorphous phase or/and compound Ta 6N 2.57 . |
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| Keywords: | tantalum ion-nitriding sarface process |
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