| 电沉积钴-钨合金薄膜的磁性能及其测量方法 |
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| 引用本文： | 廖世芳,刘洋,叶满珠. 电沉积钴-钨合金薄膜的磁性能及其测量方法[J]. 电镀与环保, 2020, 0(1): 1-3 |
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| 作者姓名： | 廖世芳 刘洋 叶满珠 |
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| 作者单位： | 咸阳师范学院;陕西铁路工程职业技术学院 |
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| 基金项目： | 陕西省教育厅哲学社会科学重点研究基地项目(17JZO79);陕西省教育厅科学研究项目(16JK1828);咸阳师范学院“青年骨干教师”(XSYGG201717);咸阳师范学院专项科研基金项目(XSYK18054);陕西省职业教育研究课题(SZJYB19-215)。 |
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| 摘 要： | 采用电沉积技术在纯铜片上制备了钴-钨合金薄膜,并研究了钴-钨合金薄膜的磁性能与其厚度、结构及表面形貌等的关系。结果表明:钴钨电沉积属于诱导共沉积,钨在钴表面氢原子的催化作用下与钴发生共沉积。钴-钨合金薄膜的厚度约为6μm,属于Co3W四面体结构,其表面由典型瘤状颗粒构成。钴-钨合金薄膜垂直方向的磁性能优于平行方向的磁性能,最大矫顽力为74.42 kA/m。
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| 关 键 词： | 钴-钨合金薄膜 电沉积 矫顽力 |
Magnetic Property of Electrodeposited Co-W Alloy Film and Measurement Method |
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| LIAO Shifang,LIU Yang,YE Manzhu. Magnetic Property of Electrodeposited Co-W Alloy Film and Measurement Method[J]. Electroplating & Pollution Control, 2020, 0(1): 1-3 |
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| Authors: | LIAO Shifang LIU Yang YE Manzhu |
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| Affiliation: | (Xianyang Normal University,Xianyang 712000,China;Shaanxi Railway Institute,Weinan 714000,China) |
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| Abstract: | Co-W alloy film was electrodeposited on pure copper sheet,and the relationship between the magnetic property and thickness,structure and surface morphology of Co-W alloy film was investigated.The results showed that the electrodeposition mechanism of Co with W belong to induced co-deposition,and W was co-deposited with Co under the catalysis of hydrogen atoms on the surface of Co.The Co-W alloy film composed of typical nodular particles possessed Co3 W tetrahedron structure with a thickness of 6 pm.The magnetic property of Co-W alloy film in the vertical orientation was better than that in the parallel orientation,and the maximum coercivity was 74.42 kA/m. |
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| Keywords: | Co-W alloy film electrodeposition coercivity |
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