| 氮氩气流量比对磁控溅射氮化钛薄膜微观结构的影响 |
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| 引用本文： | 王槐乾,姜宏伟,黄海亮,王方标,左桂鸿,郑友进. 氮氩气流量比对磁控溅射氮化钛薄膜微观结构的影响[J]. 电镀与涂饰, 2020, 0(7): 405-409 |
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| 作者姓名： | 王槐乾 姜宏伟 黄海亮 王方标 左桂鸿 郑友进 |
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| 作者单位： | 牡丹江师范学院 |
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| 基金项目： | 黑龙江省自然基金(LH2019E126);牡丹江师范学院项目(GP201605);黑龙江省高等教育教学改革项目(SJGY20180528)。 |
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| 摘 要： | 采用扫描电镜(SEM)和X射线衍射仪(XRD)研究了氮气流量(5、10、25、50 sccm)及氮氩气流量比(4∶1、3∶2、2∶3、1∶4)对磁控溅射TiN薄膜微观形貌和相组成的影响。结果显示,所得样品具有纳米级TiN薄膜的基本特征。当N2与Ar的总流量为5 sccm,而它们的流量比为4∶1时,可以制得品质较好的蓝紫色TiN薄膜。
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| 关 键 词： | 氮化钛 磁控溅射 氮气 氩气 流量比 微观结构 颜色 |
Effect of nitrogen-to-argon flow ratio on microstructure of magnetron-sputtered titanium nitride film |
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| WANG Huaiqian,JIANG Hongwei,HUANG Hailiang,WANG Fangbiao,ZUO Guihong,ZHENG Youjin. Effect of nitrogen-to-argon flow ratio on microstructure of magnetron-sputtered titanium nitride film[J]. Electroplating & Finishing, 2020, 0(7): 405-409 |
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| Authors: | WANG Huaiqian JIANG Hongwei HUANG Hailiang WANG Fangbiao ZUO Guihong ZHENG Youjin |
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| Affiliation: | (Mudanjiang Normal College,Mudanjiang 157000,China) |
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| Abstract: | The effects of nitrogen flow rate(5,10,25,or 50 sccm)and nitrogen-to-argon flow ratio(4:1,3:2,2:3,1:4)on micromorphology and phase constitution of the TiN film prepared by magnetron sputtering were studied using scanning electron microscope(SEM)and X-ray diffractometer(XRD).The results showed that all the TiN films prepared were characterized by a nanocrystalline structure.The TiN film deposited at N24 sccm and Ar 1 sccm was bluish purple and had good morphology. |
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| Keywords: | titanium nitride magnetron sputtering nitrogen argon flow ratio microstructure color |
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