MOCVD growth of cubic GaN on 3C-SiC deposited on Si (100) substrates |
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Authors: | C H Wei Z Y Xie L Y Li Q M Yu J H Edgar |
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Affiliation: | (1) Department of Chemical Engineering, Kansas State University, 66506 Manhattan, KS |
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Abstract: | The growth of cubic GaN on 3C-SiC/Si(100) by metal-organic chemical vapor deposition (MOCVD) under various growth temperatures,
thicknesses of 3C-SiC, and V/III ratios was studied. The fractions of cubic and hexagonal phases in the films were estimated
from the integrated x-ray diffraction intensities of the cubic (002) and hexagonal (1011) planes. A smooth SiC layer, a high
growth temperature, and a moderate V/III ratio are three key factors for the nucleation of the cubic phase and its subsequent
growth. Hexagonal GaN with its c-axis perpendicular to the substrate preferentially grows at the low temperature of 750°C.
The inclusion of the cubic phase increases with increasing growth temperature. The optimum growth conditions for dominant
cubic GaN formation were a growth temperature of 950°C, a 1.5 μm thick SiC layer, and a V/III ratio of 1500. With these growth
conditions, a cubic GaN layer with the cubic component of 91% was obtained. |
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Keywords: | Cubic GaN hexagonal GaN MOCVD AFM |
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