光栅尺光刻过程中的热辐射模拟分析

国产光栅尺的动态性能和精度均达不到数控机床的要求,而影响光栅尺精度的关键步骤是光刻,光刻过程中的影响因素包括机床安装的垂直度和抗干扰度,机床轨道的表面精度和水平度以及环境温度等等,其中对环境温度影响却少有研究。为了能更好的提高光栅尺的精度,本文基于Matlab对光刻过程中的曝光灯热辐射做了数据模拟分析,发现曝光灯的热辐射对光刻时的子光栅刻度等距性有很大影响,而控制这个热辐射数值目前在国内可行性更高,因为无论对于这个控制系统的复杂程度还是所需成本,相比于高精度的温度梯度微环境控制,都有一定的优越性。

Simulation analysis on thermal radiation in the process of grating scale lithography

The dynamic performance and precision of Domestic grating scale are could not reach the requirements of NC ma- chine tool, and lithography is the key process to affect the accuracy of grating scale. Factors to influence lithography process including the vertical degree of machine installation, noise immunity, surface precision, levelness of the machine tool track and environmental temperature, etc. , but few studies with the environment temperature impact. We do calculation simulate and analysis of the lamp radiation exposure in the process of lithography basis on Matlab, found that the thermal radiation of exposure lamp has a great influence to the grating scale equidistant of the sub - grating, and control the numerical size of the thermal radiation is more feasibility in Domestic, because no matter the complexity of the control system or the costs needed, compared to the micro - environment control precision of temperature gradient, it owns its advantages.