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Preparation of carbonaceous thin films by plasma-assisted chemical vapor deposition using active fluorine atoms |
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| Authors: | Tomokazu Fukutsuka Yosohiro Sugie Zempachi Ogumi |
| Affiliation: | a Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2280, Japan b Graduate School of Engineering, Kyoto University, Nishikyo-ku, Kyoto 615-8510, Japan |
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