Impact of gate-leakage currents on CMOS circuit performance |
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Authors: | Alessandro Marras Ilaria De Munari Davide Vescovi Paolo Ciampolini |
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Affiliation: | Dipartamento di Ing. dell’Informazione, Università di Parma, Parco Area delle Scienze 181/A, 43100 Parma, Italy |
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Abstract: | Ultra-thin gate dielectrics are exploited in fabrication of MOSFETs featuring channel lengths in the decananometer range: according to the ITRS oxide thickness in the order of 1 nm will be used in 2005 for ultra-short channel CMOS. For such aggressively scaled devices, gate-leakage currents represent a critical issue. In this paper, a study on the impact of direct-tunneling (DT) current on the performance of a wide variety of CMOS circuits is presented. The approach relies on a mixed-mode simulation approach, which allows for predicting the correlation of major performance indices with oxide thickness. |
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