Flat-field spectrograph in SiO2/Si |
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| Authors: | Clemens P.C. Marz R. Reichelt A. Schneider H.W. |
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| Affiliation: | Siemens AG, Munich; |
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| Abstract: | The operation of a flat-field spectrograph in silica glass on silicon (SiO2/Si) as a demultiplexer with 4-nm channel spacing in the 1.5-μm waveguide length region is demonstrated. The concept allows fabrication tolerances to be compensated simultaneously with the adjustment of fan-out. Fiber-to-fiber insertion loss of 10.1 dB and crosstalk attenuation >15 dB have been achieved |
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