钛片电化学抛光工艺及耐蚀性研究

以含氯离子的乙二醇溶液为抛光液,研究了槽压、温度、时间对钛片表面电化学抛光效果的影响,得到电化学抛光的最佳工艺为:槽压30V,温度50℃,时间180 s.采用扫描电镜、Tafel极化曲线及表面粗糙度测试等方法,研究了电化学抛光后钛片的表面形貌、耐蚀性、粗糙度等性能,同时与传统的机械抛光及化学抛光方法进行了比较.结果表明...

Study on electropolishing process and corrosion resistance of titanium plate

The influence of applied voltage,temperature and time on the electropolishing(EP) effect of titanium plate in a Cl-containing ethylene glycol solution was studied. The optimal process parameters are as follows:voltage 30 V,temperature 50 °C,and time 180 s. The surface morphology,corrosion resistance and surface roughness of the electropolished titanium plate were studied by scanning electron microscope,Tafel polarization curve and surface roughness measurement,respectively. A comparison of electropolished titanium plate with the mechanically and chemically polished titanium plates demonstrated that electrochemical polishing is superior to the traditional polishing technologies. Both the passivity-maintaining current density and corrosion current density of the electropolished titanium plate are lower than those of the traditional polished titanium plates,implying that the electropolished titanium plate has the best corrosion resistance.