偶氮金属镍薄膜的折射率和吸收特性研究

偶氮金属镍(Ni(azo)2)是一类具有很大潜力的可录光盘存储介质。为了准确地获取一种偶氮金属镍薄膜的光学常数，用旋涂法(Spin—coating)在单晶硅片上制备了Ni(azo)2薄膜。在波长扫描和入射角可变全自动椭圆偏振光谱仪上研究了Ni(azo)2薄膜的椭偏光谱。采用逼近算法获得了Ni(azo)2薄膜在可见光范围内的复折射率、复介电函数、吸收系数和薄膜厚度。分析了Ni(azo)2薄膜可见吸收光谱的形成机理。结果表明在波长650nm处薄膜的折射率为2．19，吸收常数为0．023，具有良好的吸收和反射特性，显示出作为高密度数字多用光盘(DVD-R)记录介质的良好应用前景。

Study on the Refractive Index and Absorption of Azo Nickel Chelate Thin Film

In order to determine optical constants of azo nickel chelate (Ni(azo)_2) thin film, the ellipsometric spectra of Ni(azo)_2 thin film, which prepared by spin-coating method on a single-crystal silicon, have been investigated on a scanning ellipsometer with the analyzer and polarizer rotating synchronously. The complex refractive index, complex dielectric function, absorption coefficient and thickness of the film were obtained through drawing up simulation. The absorption spectrum is discussed. These results indicate that the film has a good reflective and absorption characters at the wavelength of 650 nm and is promising for application as recording media for digital versatile disc (DVD-R).