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Effect of indium doping on zinc oxide films prepared by chemical spray pyrolysis technique
Authors:Girjesh Singh  S. B. Shrivastava  Deepti Jain  Swati Pandya  T. Shripathi  V. Ganesan
Affiliation:(1) Physics Department, Sciences Faculty, USTOMB University, BP1505 Oran, Algeria;(2) Thin Films & Plasma Lab, Physics Department, Ment. University, 25000 Constantine, Algeria;(3) Physics Department, Faculty of Sciences and Arts, Firat University, 23119 Elazig, Turkey;(4) Centro de Investigacion en Energia -UNAM, Temixco, Morelos, 62580, Mexico;
Abstract:We report the conducting and transparent In doped ZnO films fabricated by a homemade chemical spray pyrolysis system (CSPT). The effect of In concentration on the structural, morphological, electrical and optical properties have been studied. These films are found to show (0 0 2) preferential growth at low indium concentrations. An increase in In concentration causes a decrease in crystalline quality of films as confirmed by X-ray diffraction technique which leads to the introduction of defects in ZnO. Indium doping also significantly increased the electron concentrations, making the films heavily n type. However, the crystallinity and surface roughness of the films decreases with increase in indium doping content likely as a result of the formation of smaller grain size, which is clearly displayed in AFM images. Typical optical transmittance values in the order of (80%) were obtained for all films. The lowest resistivity value of 0.045 Ω-m was obtained for film with 5% indium doping.
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