Micro-aspiration assisted lithography |
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| Affiliation: | 1. Ecole Normale Supérieure of Paris, 24 rue Lhomond, 75005 Paris, France;2. Laboratoire de Photonique et de Nanostructures, CNRS, Route de Nozay, 91460 Marcoussis, France;1. Canakkale Onsekiz Mart University, Faculty of Engineering, Department of Chemical Engineering, 17200, Canakkale, Turkey;2. Piri Reis University, Faculty of Science and Letters, 34940, Tuzla, Istanbul, Turkey;1. Graduate School of Science and Technology, Kumamoto University, 2-39-1 Kurokami, Chuou-ku, Kumamoto 860-8555, Japan;2. Department of Materials Science and Technology, Tokyo University of Science, 6-3-1 Niijuku, Katsushika-ku, Tokyo 125-8585, Japan;1. Departamento de Química de Radiaciones y Radioquímica, Instituto de Ciencias Nucleares, Universidad Nacional Autónoma de México, Ciudad de México 04510, México;2. Departamento de Ingeniería Molecular de Materiales, Centro de Física Aplicada y Tecnología Avanzada, Universidad Nacional Autónoma de México, Querétaro 76230, México;3. Centro Universitario de Vinculación y Transferencia de Tecnología, Benemérita Universidad Autónoma de Puebla, Puebla 72000, México;1. Instituto de Ciencia y Tecnología de Polímeros (ICTP), Consejo Superior de Investigaciones Científicas (CSIC), C/Juan de la Cierva 3, 28006 Madrid, Spain;2. Departamento de Química Física Aplicada, Facultad de Ciencias, Universidad Autónoma de Madrid, C/Francisco Tomás y Valiente 7, Cantoblanco, 28049 Madrid, Spain;3. Instituto de Química Orgánica General, CSIC, Juan de la Cierva 3, 28006 Madrid, Spain;4. Université de Lyon, Lyon F-69003, France;5. INSA-Lyon, IMP, Villeurbanne F-69621, France;6. CNRS, UMR 5223, Ingénierie des Matériaux Polymères, Villeurbanne F-69621, France |
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| Abstract: | We report on a micro-fabrication method based on micro-aspiration assisted lithography (MAAL). Unlike nanoimprint lithography where a mould is pressed into a resist layer spin coated on a substrate, MAAL uses aspiration forces to guide the resist material in the mould cavities. By suing this technique, the limit of capillary based lithography techniques has been extended. Double layer PDMS moulds were fabricated using multi-layer soft-lithography in which a micro-aspiration network could be introduced close to the pattern layer of the mould. As a result, high resolution patterning could be obtained with a UV curable resist. We also show the results of patterning of a thin layer of PDMS, nano-particles as well as agar gels. We have also provided a semi-quantitative analysis in order to understand the limitation of different approaches. |
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