Simulation and analysis for microstructure profile of optical lithography based on SU-8 thick resist |
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| Affiliation: | 1. Department of Physics, Sichuan University, Chengdu 610064, PR China;2. School of Opto-Electronic Information, University of Electronic Science and Technology of China, Chengdu 610054, PR China;3. Nanofabrication Center, University of Minnesota, Minneapolis, MN 55455, USA;1. UMR-CNRS 6164, IETR, Université de Rennes 1, Campus de Beaulieu, 35042 Rennes Cedex, France;2. UMR-CNRS 6226, Institut des Sciences Chimiques de Rennes, Equipe MaCSE, Université de Rennes 1, Campus de Beaulieu, 35042 Rennes Cedex, France;3. UMR-CNRS 6502, Institut des Matériaux Jean Rouxel Université de Nantes, 2 rue de la Houssinière, BP32229, F-44322 Nantes Cedex 3, France;1. Green Nanoelectronics Collaborative Research Center (GNC), National Institute of Advanced Industrial Science and Technology (AIST), West 7A, Onokawa 16-1, Tsukuba, Ibaraki 305-8569, Japan;2. School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki, Kanagawa 214-8571, Japan;1. CNRS, IM2NP, Faculté des Sciences de Saint-Jérôme case 142, 13397 Marseille, France;2. Aix-Marseille Université, IM2NP, Marseille, France;3. Department of Physics, University of Central Florida, Orlando, FL 32816, USA;4. Aix-Marseille Université, CINAM, Campus de Luminy Case 913, 13288 Marseille, France;1. School of Aerospace, Mechanical and Mechatronic Engineering, The University of Sydney, Sydney, NSW 2006, Australia;2. School of Electrical, Electronic and Computer Engineering, The University of Western Australia, Perth, WA 6009, Australia;3. Department of Electronic Materials Engineering, Research School of Physics and Engineering, The Australian National University, Canberra, ACT 0200, Australia;4. Materials Engineering and Centre for Microscopy and Microanalysis, The University of Queensland, Brisbane, QLD 4072, Australia;5. Australian Centre for Microscopy and Microanalysis, The University of Sydney, Sydney, NSW 2006, Australia |
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| Abstract: | Profile simulation of optical lithography is very useful for micro-fabrication of microstructure with high sidewall quality. In this paper the light wave propagation, exposure and development process were analyzed, and modeling for thick film lithography was developed to accurately and rapidly obtain simulated results. The effect of exposure dose on the profile quality after development were simulated and discussed, which show that these process parameters have a great impact on the profile quality of microstructure. With guidance of the simulation and analysis, the micro-gear and micro-piston of micro-motor fabricated by SU-8 thick resist were presented. |
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