Micro/nano-heater integrated cantilevers for micro/nano-lithography applications |
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| Affiliation: | 1. Henan Key Laboratory of Laser and Opto-electric Information Technology, Zhengzhou University, Henan 450052, China;2. Center for Bioengineering and Biotechnology, China University of Petroleum, 66 Changjiang West Road, Qingdao, Shandong 266580, China;1. Research Institute of Advanced Materials (RIAM), Department of Materials Science and Engineering, Seoul National University, Seoul 08826, Republic of Korea;2. Department of Fiber System Engineering, Dankook University, Gyeonggi Do 16890, Republic of Korea;1. Department of Chemical and Materials Engineering, University of Alberta, Edmonton, AB T6G 2V4, Canada;2. Department of Mechanical and Manufacturing Engineering, University of Calgary, Calgary, AB T2N 1N4, Canada;3. Department of Chemical Engineering, Pohang University of Science and Technology, Pohang 790-784, Republic of Korea;1. Department of Energy Resources Engineering, Inha University, Republic of Korea;2. Korea Atomic Energy Research Institute, Republic of Korea |
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| Abstract: | This paper describes an array of micro/nano-heater-integrated cantilevers for micro- and nano-lithography applications. In the scanning thermal cantilever, as the electrical current flows through the cantilever with a conductive tip, electrical power is dissipated mainly within the tip area, and this dissipation raises the local temperature around the tip area. When the thermal power is applied to a thin photoresist film, spin-coated on silicon wafers or mask substrates, more than 90% of solvents involved in the photoresist starts to evaporate from the layer. Hence, the exposed areas can resist commercial developers during the development process. Patterning speed has been improved by employing an array of heaters with various sizes. The novel concept of the SPM-based nano-lithography has been successfully demonstrated by application on the fabricated cantilevers and a commercial SPM system. |
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