A Moiré method for high accuracy alignment in nanoimprint lithography |
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Affiliation: | 1. AML, School of Aerospace Engineering, Tsinghua University, Beijing 100084, China;2. School of Aerospace Engineering, Beijing Institute of Technology, Beijing 100081, China |
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Abstract: | Nanoimprint lithography (NIL) is a cost efficient technique for the mass production of nanostructures. We demonstrate alignment accuracies in the range of 100 nm and below in UV-based nanoimprint lithography (UV-NIL) using a simple optical technique. The advantages of this technique are the relative simplicity of the marker-design and the whole setup combined with the possibility of an upgrade of existing equipment and still ultra-high precision alignment capabilities. |
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