Fluorinated materials for UV nanoimprint lithography |
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Affiliation: | 1. AMO GmbH, AMICA, Otto-Blumenthal-Straße 25, D-52074 Aachen, Germany;2. micro resist technology GmbH, Köpenicker Str. 325, 12555 Berlin, Germany;1. Department of Materials Science and Engineering, Southern University of Science and Technology, 1088 Xueyuan Blvd, Nanshan District, Shenzhen, Guangdong 518055, China;2. SUSTech Academy for Advanced Interdisciplinary Studies, Southern University of Science and Technology, 1088 Xueyuan Blvd, Nanshan District, Shenzhen, Guangdong 518055, China |
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Abstract: | The “demolding” is the important key for UV nanoimprint lithography (UV-NIL) which attracts a lot of attention recently as microfabrication technique. Then, we present in this paper, new fluorinated mold material and new fluorinated photosensitive polymer which are suitable for the UV-NIL because of their high transparency and excellent mold-release characteristics. By using our mold material “F-template”, the process cost can be drastically reduced because it can be used as replicated mold instead of using expensive quartz master mold. F-template requires no releasing agent is another advantage. We also developed photosensitive polymer “NIF-A-1” which has high transparency, good mold-releasing ability and good dry etching resistance. Unlike the common photosensitive polymer, NIF-A-1 did not need a releasing agent on the mold. |
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