Fabrication of 50 nm patterned nickel stamp with hot embossing and electroforming process |
| |
| Affiliation: | 1. Department of Materials and Science Engineering, Korea University, 5-1 Anam-dong, Sungbuk-Gu, Seoul 136-701, Republic of Korea;2. Photovoltaic Laboratory, Korea Institute of Energy Research, 152 Gajeong-ro, Yuseong-gu, Daejeon 305-343, Republic of Korea;3. KIER-UNIST Advanced Center for Energy, Korea Institute of Energy Research, 152 Gajeong-ro, Yuseong-gu, Daejeon 305-343, Republic of Korea;1. Institute of Materials Science, Kaunas University of Technology, Barsausko 59, LT-51423 Kaunas, Lithuania;2. Department of Technology, Kaunas University of Technology, Panevezys Faculty, Daukanto 12, LT-35212 Panevezys, Lithuania;3. Qorvo, 7628 Thorndike Road Greensboro, NC 27409, United States |
| |
| Abstract: | Fabrication of imprint stamp is a key issue of nanoimprint lithography. In this study, we attempt to fabricate the nickel imprint stamp using hot embossing lithography and electroforming processes. As small as 50 nm sized patterns of original silicon master were faithfully transferred to polyvinyl chloride (PVC) film. By electroforming on hot embossed PVC film, nickel stamp, which has the same patterns of original silicon master stamp, was successfully fabricated. |
| |
| Keywords: | |
| 本文献已被 ScienceDirect 等数据库收录！ |
|
