| 铬过渡层对氮化铬/镁合金膜基界面结合强度的影响 |
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| 引用本文： | 刘瑞霞,郭锋,韩海鹏. 铬过渡层对氮化铬/镁合金膜基界面结合强度的影响[J]. 金属热处理, 2021, 46(1): 143-148. DOI: 10.13251/j.issn.0254-6051.2021.01.027 |
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| 作者姓名： | 刘瑞霞 郭锋 韩海鹏 |
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| 作者单位： | 1.内蒙古鄂尔多斯职业学院 机电工程系,内蒙古 鄂尔多斯 017000; 2.内蒙古自治区涂层与薄膜重点实验室,内蒙古 呼和浩特 010051; 3.内蒙古工业大学 材料科学与工程学院,内蒙古 呼和浩特 010051 |
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| 基金项目： | 内蒙古自治区科技重大专项 |
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| 摘 要： | 为了提高磁控溅射氮化铬膜与镁合金基底的结合强度,在两者之间以不同工艺溅射沉积铬过渡层,分析并讨论了铬过渡层对膜基界面结合强度的影响及其机制.结果表明,在镁合金/氮化铬之间增加铬过渡层可提高表征膜基结合强度的膜层破裂临界载荷,且当铬过渡层的溅射工艺为溅射功率100 W、负偏压30 V、基底温度25℃、溅射时间4 min时...
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| 关 键 词： | 镁合金 磁控溅射 氮化铬膜 铬过渡层 膜基结合强度 |
| 收稿时间： | 2020-06-15 |
Effect of chromium transition layer on interface bonding strength between chromium nitride film and magnesium alloy substrate |
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| Liu Ruixia,Guo Feng,Han Haipeng. Effect of chromium transition layer on interface bonding strength between chromium nitride film and magnesium alloy substrate[J]. Heat Treatment of Metals, 2021, 46(1): 143-148. DOI: 10.13251/j.issn.0254-6051.2021.01.027 |
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| Authors: | Liu Ruixia Guo Feng Han Haipeng |
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| Affiliation: | 1. Department of Mechanical and Electrical Engineering,Ordos Vocational College,Ordos Inner Mongolia 017000,China; 2. Inner Mongolia Key Laboratory of Coating and Film,Hohhot Inner Mongolia 010051,China; 3. School of Materials Science and Engineering,Inner Mongolia University of Technology,Hohhot Inner Mongolia 010051,China |
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| Abstract: | To improve the bonding strength of magnetron sputtering chromium nitride film and magnesium alloy substrate,the chromium transition layer was deposited by different magnetron puttering processes between them,the influence of chromium transition layer on interface bonding strength between film and substrate and its mechanism were analyzed and discussed.The results show that adding chromium transition layer can increase the fracture critical load of film which characterizes the bonding strength of film and substrate,and the fracture critical load of film reaches the largest when the magnetron sputtering process of chromium transition layer is 100 W of sputtering power,30 V of negative bias voltage,25℃of substrate temperature and 4 min of sputtering time,in which process the surface of chromium transition layer has the largest roughness and the smallest protuberance interval.The enhancing action of chromium transition layer on interface bonding is mainly reflected by improving the bonding between chromium nitride and magnesium alloy substrate,it is related to the larger contact area and the effective mechanical interlock between chromium transition layer and chromium nitride film,as well as the reduction of interface stress by chromium transition layer. |
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| Keywords: | magnesium alloy magnetron sputtering chromium nitride film chromium transition layer bonding strength of film and substrate |
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