Real-time statistical process control using tool data[semiconductor manufacturing] |
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| Authors: | Spanos C.J. Guo H.-F. Miller A. Levine-Parrill J. |
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| Affiliation: | Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA; |
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| Abstract: | A process monitoring scheme that takes advantage of real-time information in order to generate malfunction alarms is described. This is accomplished with the application of time-series filtering and multivariate statistical process control. This scheme is capable of generating alarms on a true real-time basis, while the wafer is still in the processing chamber. Several examples are presented with tool data collected from the SECSII port of single-wafer plasma etchers |
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