Epitaxial growth of ferromagnetic CrO2 films in air |
| |
| Authors: | S. Ishibashi T. Namikawa M. Satou |
| |
| Affiliation: | The Graduate School at Nagatsuta, Tokyo Institute of Technology, Nagatsuta, Yokohamashi, Japan |
| |
| Abstract: | Epitaxial growth of CrO2 films under atmospheric pressure has been investigated. Single crystal films of CrO2 were obtained by the thermal decomposition of gaseous CrO3 onto the substrates of rutile single crystals in air. The optimum temperature of the substrate for the pure CrO2 epitaxial films was found to be 390°C. At the substrate temperature of 380°C, the obtained film included Cr2O5 as impurities, and Cr2O3 appeared at 400°C. Magnetic domain patterns of these films were observed by longitudinal Kerr effect. The growth patterns of domain were obtained with applied field. |
| |
| Keywords: | |
| 本文献已被 ScienceDirect 等数据库收录！ |
|
