Simulation of current-voltage characteristics of a ferroelectric field-effect transistor

Current-voltage (I-V) characteristics of an all-perovskite ferroelectric-semiconductor field-effect transistor (FET) were simulated. The modeling is based on an analysis of an experimental hysteresis loop of a metal-ferroelectric-metal structure. The charge in the semiconductor, electric fields in the semiconductor and ferroelectric (FE), and FE polarization at the FE-semiconductor interface are calculated at a given semiconductor surface potential. The Poisson equation is solved numerically across the FE thickness. The semiconductor surface potential, semiconductor charge, FE polarization, electric field and voltage drop in the FE are calculated as functions of the applied voltage. By using appropriate semiconductor thickness and built-in voltage between the FE and the gate, it is possible to provide a remanent polarization necessary for the opening and blocking of the FET channel in the ascending and descending portions of the hysteresis loop, respectively. The I-V characteristics and the voltage drop along the FET channel are calculated and analyzed for both polarities of the drain bias. The results make it possible to predict I-V characteristics of an all-perovskite ferroelectric FET.