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射频磁控溅射法制备氮化硼薄膜
引用本文:李宁,邵红红. 射频磁控溅射法制备氮化硼薄膜[J]. 机械工程材料, 2006, 30(11): 15-17
作者姓名:李宁  邵红红
作者单位:江苏大学材料科学与工程学院,江苏,镇江,212013;江苏大学材料科学与工程学院,江苏,镇江,212013
摘    要:采用射频磁控溅射方法在T10钢表面获得了氮化硼薄膜。借助光学显微镜、摩擦磨损试验仪和划痕试验仪等研究了溅射时间、溅射功率以及中间层对薄膜性能的影响。结果表明:氮化硼薄膜的摩擦因数约为钢基材料的一半,中间层镍磷合金的加入使薄膜结合力显著提高。

关 键 词:射频磁控溅射  氮化硼薄膜  摩擦因数  结合力
文章编号:1000-3738(2006)11-0015-03
收稿时间:2005-11-14
修稿时间:2005-11-142006-03-10

Deposition of BN Films by Radio Frequency Magnetron Sputtering
LI Ning,SHAO Hong-hong. Deposition of BN Films by Radio Frequency Magnetron Sputtering[J]. Materials For Mechanical Engineering, 2006, 30(11): 15-17
Authors:LI Ning  SHAO Hong-hong
Affiliation:Jiangsu University, Zhenjiang 212013, China
Abstract:The film of boron nitride(BN) was deposited on the surface of T10 steel by the method of radio frequency magnetron sputtering at room-temperature. With optical microscope, friction and wear spectrometer and scratch spectrometer, the influence of the parameters of sputtering time, sputtering power and interface layer on the film was studied The results showed that the friction factor of BN film was about half of that of the steel based materials, and the cohesion between film and substrate could obviously be increased by the Ni-P interface layer.
Keywords:radio frequency magnetron sputtering   BN film   friction factor   cohesion
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